
A special agitator shaft with symmetrically arranged agitator pegs and sleeves of tungsten carbide for wear protection devel- Vertical, batch operation mill for the preparation of tungsten Ideal flow behaviour due to a special agitator peg arrange-ment and the hemispherically shaped chamber floor integrated screen plate for grinding media separationIntensive cooling through a double-wall grinding tank and cooled circulation pipeline

Product inlet via rotor / immersion tube system prevents back flow of grinding media into the feed line.

Generally, there are two ways to obtain nano-powders. A bottom-up manufacturing method (bottom up) for chemical methods, such as chemical precipitation, sol-gel process (sol-gel),... Another method is physical method, which changes the powder particles from big to small (top down), such as mechanical ball milling,... And so on.

The Development In 1963, the first vertical agitator was developed internationally, the first horizontal agitator was developed in 1975, the first horizontal agitator bead mill with eccentric disks was introduced to the public and the horizontal disc grinder was introduced, in 2004, which became the industry standard. In the following years, the grinding media separation systems, the geometry of the grinding disks and the various grinding chamber materials were further developed.

The grinding system pin nanomill shows the evolutionary develop- ment of system with the rotor-slotted pipe separating system. The enclosed horizontal agitator mill is designed for highest product throughput rates and possesses a pin grinding system for highest grinding intensity.

In 2011, we developed the first zirconia comminution chamber technology in China. It has no metal ion pollution and is used in batteries, pharmaceuticals, glazes, ink and food.

砂磨機(jī)由裝有研磨珠的研磨室組成,研磨室可以是靜止的,研磨珠由攪拌器攪動(dòng);或者,整個(gè)研磨室做復(fù)雜運(yùn)動(dòng),帶動(dòng)研磨珠運(yùn)動(dòng)。生產(chǎn)過(guò)程中,將藥物粗粉置于含表面活性劑/穩(wěn)定劑的溶液中,經(jīng)高速攪拌得到粗混懸液。然后其經(jīng)砂磨機(jī)研磨,固體顆粒粒徑逐漸減小至納米級(jí)別,得到納米混懸液。
其中,產(chǎn)品細(xì)度主要由兩個(gè)基本參數(shù)決定———應(yīng)力強(qiáng)度和接觸點(diǎn)數(shù)目。應(yīng)力強(qiáng)度取決于研磨珠動(dòng)能,能量足夠高才能達(dá)到研磨效果。接觸點(diǎn)數(shù)目決定了材料和研磨珠作用的次數(shù),接觸點(diǎn)數(shù)目足夠多時(shí)產(chǎn)品才能達(dá)到良好的粒徑分布。為增加接觸點(diǎn)數(shù)目,可采用更小的研磨珠。根據(jù)經(jīng)驗(yàn),產(chǎn)品粒子大小可達(dá)研磨珠大小的1/1000。一般使用100~200μm大小的研磨珠制備納米粒較簡(jiǎn)單,較易規(guī);a(chǎn),同時(shí)成本也較低。
砂磨機(jī)具有的優(yōu)點(diǎn)包括:很好地控制粒徑、大大降低成本、可大規(guī)模生產(chǎn)、活性成分零污染或極少污染、生產(chǎn)過(guò)程具重現(xiàn)性、產(chǎn)品滿足美國(guó)cGMP要求等。以砂磨機(jī)生產(chǎn)納米產(chǎn)品最重要的是選擇適合的研磨珠和研磨室,避免污染產(chǎn)品。研磨區(qū)域應(yīng)以良好的材料鑄造。